Thin metal oxide films on transparent substrates for Li-insertion devices
Identifieur interne : 000229 ( Main/Exploration ); précédent : 000228; suivant : 000230Thin metal oxide films on transparent substrates for Li-insertion devices
Auteurs : RBID : ISTEX:10800_1993_Article_BF00625594.pdfAbstract
Lithium insertion in metal oxides is a process of interest in many electrochemical applications, including rechargeable batteries and electrochromic displays. In this work we have examined the characteristics of this process in a series of oxides prepared in the thin-film configuration. The lithium insertion process has been examined in WO3, NiO, V2O5, Nb2O5 and tin-doped indium oxide (ITO) thin film electrodes deposited on transparent substrates. We have considered various aspects of the insertion process in these oxides with particular attention to charge capacity, reversibility, kinetics, structural and optical changes. The results suggest that the process may induce irreversible modifications in some of the host structures. However, under certain well defined conditions, the process occurs reversibly and thus some of the studied oxides may find successful application in electrochemical devices of prime technological interest.
DOI: 10.1007/BF00625594
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Scrosati</name><affiliation wicri:level="1"><mods:affiliation>Chemistry Department, University “La Sapienza”, Roma, Italy</mods:affiliation><country xml:lang="fr">Italie</country><wicri:regionArea>Chemistry Department, University “La Sapienza”, Roma</wicri:regionArea><placeName><settlement type="city">Rome</settlement><region nuts="2">Latium</region></placeName></affiliation></author><author><name>D. Zane</name><affiliation wicri:level="1"><mods:affiliation>Chemistry Department, University “La Sapienza”, Roma, Italy</mods:affiliation><country xml:lang="fr">Italie</country><wicri:regionArea>Chemistry Department, University “La Sapienza”, Roma</wicri:regionArea><placeName><settlement type="city">Rome</settlement><region nuts="2">Latium</region></placeName></affiliation></author><author><name>F. Decker</name><affiliation wicri:level="1"><mods:affiliation>Chemistry Department, University “La Sapienza”, Roma, Italy</mods:affiliation><country xml:lang="fr">Italie</country><wicri:regionArea>Chemistry Department, University “La Sapienza”, Roma</wicri:regionArea><placeName><settlement type="city">Rome</settlement><region nuts="2">Latium</region></placeName></affiliation></author></titleStmt><publicationStmt><idno type="RBID">ISTEX:10800_1993_Article_BF00625594.pdf</idno><date when="1993">1993</date><idno type="doi">10.1007/BF00625594</idno><idno type="wicri:Area/Main/Corpus">000321</idno><idno type="wicri:Area/Main/Curation">000321</idno><idno type="wicri:Area/Main/Exploration">000229</idno></publicationStmt></fileDesc><profileDesc><textClass></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="eng">Lithium insertion in metal oxides is a process of interest in many electrochemical applications, including rechargeable batteries and electrochromic displays. In this work we have examined the characteristics of this process in a series of oxides prepared in the thin-film configuration. The lithium insertion process has been examined in WO3, NiO, V2O5, Nb2O5 and tin-doped indium oxide (ITO) thin film electrodes deposited on transparent substrates. We have considered various aspects of the insertion process in these oxides with particular attention to charge capacity, reversibility, kinetics, structural and optical changes. The results suggest that the process may induce irreversible modifications in some of the host structures. However, under certain well defined conditions, the process occurs reversibly and thus some of the studied oxides may find successful application in electrochemical devices of prime technological interest.</div></front></TEI><mods xsi:schemaLocation="http://www.loc.gov/mods/v3 file:///applis/istex/home/loadistex/home/etc/xsd/mods.xsd" version="3.4" istexId="36d4407eac469525651e7fcf7a6d0579c45d4a67"><titleInfo lang="eng"><title>Thin metal oxide films on transparent substrates for Li-insertion devices</title></titleInfo><name type="personal"><namePart type="given">S.</namePart><namePart type="family">Passerini</namePart><role><roleTerm type="text">author</roleTerm></role><affiliation>Chemistry Department, University “La Sapienza”, Roma, Italy</affiliation></name><name type="personal"><namePart type="given">J.</namePart><namePart type="family">Scarminio</namePart><role><roleTerm type="text">author</roleTerm></role><affiliation>Chemistry Department, University “La Sapienza”, Roma, Italy</affiliation></name><name type="personal"><namePart type="given">B.</namePart><namePart type="family">Scrosati</namePart><role><roleTerm type="text">author</roleTerm></role><affiliation>Chemistry Department, University “La Sapienza”, Roma, Italy</affiliation></name><name type="personal"><namePart type="given">D.</namePart><namePart type="family">Zane</namePart><role><roleTerm type="text">author</roleTerm></role><affiliation>Chemistry Department, University “La Sapienza”, Roma, Italy</affiliation></name><name type="personal"><namePart type="given">F.</namePart><namePart type="family">Decker</namePart><role><roleTerm type="text">author</roleTerm></role><affiliation>Chemistry Department, University “La Sapienza”, Roma, Italy</affiliation></name><typeOfResource>text</typeOfResource><genre>Papers</genre><genre>Original Paper</genre><originInfo><publisher>Kluwer Academic Publishers, Dordrecht</publisher><dateCreated encoding="w3cdtf">1992-11-27</dateCreated><dateValid encoding="w3cdtf">2004-10-19</dateValid><copyrightDate encoding="w3cdtf">1993</copyrightDate></originInfo><language><languageTerm type="code" authority="iso639-2b">eng</languageTerm></language><physicalDescription><internetMediaType>text/html</internetMediaType></physicalDescription><abstract lang="eng">Lithium insertion in metal oxides is a process of interest in many electrochemical applications, including rechargeable batteries and electrochromic displays. In this work we have examined the characteristics of this process in a series of oxides prepared in the thin-film configuration. The lithium insertion process has been examined in WO3, NiO, V2O5, Nb2O5 and tin-doped indium oxide (ITO) thin film electrodes deposited on transparent substrates. We have considered various aspects of the insertion process in these oxides with particular attention to charge capacity, reversibility, kinetics, structural and optical changes. The results suggest that the process may induce irreversible modifications in some of the host structures. However, under certain well defined conditions, the process occurs reversibly and thus some of the studied oxides may find successful application in electrochemical devices of prime technological interest.</abstract><relatedItem type="series"><titleInfo type="abbreviated"><title>J Appl Electrochem</title></titleInfo><titleInfo><title>Journal of Applied Electrochemistry</title><partNumber>Year: 1993</partNumber><partNumber>Volume: 23</partNumber><partNumber>Number: 11</partNumber></titleInfo><genre>Archive Journal</genre><originInfo><dateIssued encoding="w3cdtf">1993-11-01</dateIssued><copyrightDate encoding="w3cdtf">1993</copyrightDate></originInfo><subject usage="primary"><topic>Chemistry</topic><topic>Physical Chemistry</topic><topic>Industrial Chemistry/Chemical Engineering</topic></subject><identifier type="issn">0021-891X</identifier><identifier type="issn">Electronic: 1572-8838</identifier><identifier type="matrixNumber">10800</identifier><identifier type="local">IssueArticleCount: 19</identifier><recordInfo><recordOrigin>Chapman & Hall, 1993</recordOrigin></recordInfo></relatedItem><identifier type="doi">10.1007/BF00625594</identifier><identifier type="matrixNumber">Art16</identifier><identifier type="local">BF00625594</identifier><accessCondition type="use and reproduction">MetadataGrant: OpenAccess</accessCondition><accessCondition type="use and reproduction">AbstractGrant: OpenAccess</accessCondition><accessCondition type="restriction on access">BodyPDFGrant: Restricted</accessCondition><accessCondition type="restriction on access">BodyHTMLGrant: Restricted</accessCondition><accessCondition type="restriction on access">BibliographyGrant: Restricted</accessCondition><accessCondition type="restriction on access">ESMGrant: Restricted</accessCondition><part><extent unit="pages"><start>1187</start><end>1195</end></extent></part><recordInfo><recordOrigin>Chapman & Hall, 1993</recordOrigin><recordIdentifier>10800_1993_Article_BF00625594.pdf</recordIdentifier></recordInfo></mods></record>Pour manipuler ce document sous Unix (Dilib)
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